XU Lingmao
Science and Technology on Vacuum Technology and Physics Laboratory, Lanzhou Institute of Physics, Lanzhou 730001, ChinaHE Yanchun
Science and Technology on Vacuum Technology and Physics Laboratory, Lanzhou Institute of Physics, Lanzhou 730001, ChinaLI Kun
Science and Technology on Vacuum Technology and Physics Laboratory, Lanzhou Institute of Physics, Lanzhou 730001, ChinaZHOU Hui
Science and Technology on Vacuum Technology and Physics Laboratory, Lanzhou Institute of Physics, Lanzhou 730001, ChinaXIONG Yuqing
Science and Technology on Vacuum Technology and Physics Laboratory, Lanzhou Institute of Physics, Lanzhou 730001, ChinaScience and Technology on Vacuum Technology and Physics Laboratory, Lanzhou Institute of Physics, Lanzhou 730001, China
XU Lingmao, HE Yanchun, LI Kun, ZHOU Hui, XIONG Yuqing. Study on thickness uniformity of Ta2O5 film evaporated on the inner-face of a hemispherical substrate[J]. Optoelectronics Letters,2021,17(11):673-677
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