Study on thickness uniformity of Ta2O5 film evaporated on the inner-face of a hemispherical substrate
CSTR:
Author:
Affiliation:

Science and Technology on Vacuum Technology and Physics Laboratory, Lanzhou Institute of Physics, Lanzhou 730001, China

  • Article
  • | |
  • Metrics
  • |
  • Reference
  • |
  • Related
  • | | |
  • Comments
    Abstract:

    Theoretical analysis and experimental study on the thickness distribution of Ta2O5 film evaporated on the inner-face of a hemispherical substrate are demonstrated. It is derived that the value of n/R and L/R influence the film thickness distribution (where R is the radius of the hemisphere, n and L are the horizontal distance and vertical height between the evaporation source and the center of the hemisphere, respectively). The whole hemispherical substrate can be coated when nL+R, otherwise there is a “blind area” on the substrate when the substrate is self-rotating. A hemispherical composite substrate with a radius of 200 mm is coated with Ta2O5 protective film under a certain configuration, the thickness of Ta2O5 film at the edge is 0.372 times the film at the vertex which shows that the evaporation characteristics of Ta2O5 tend to be a point source.

    Reference
    Related
    Cited by
    Comments
    Comments
    分享到微博
    Submit
Get Citation

XU Lingmao, HE Yanchun, LI Kun, ZHOU Hui, XIONG Yuqing. Study on thickness uniformity of Ta2O5 film evaporated on the inner-face of a hemispherical substrate[J]. Optoelectronics Letters,2021,17(11):673-677

Copy
Share
Article Metrics
  • Abstract:621
  • PDF: 4
  • HTML: 0
  • Cited by: 0
History
  • Received:March 25,2021
  • Revised:June 06,2021
  • Online: November 26,2021
Article QR Code