1. Key Laboratory of Photoelectronic Materials, Ningbo University, Ningbo 315211, China;;2. Ningbo Institute of Materials Technology and Engineering, Chinese Academy of Sciences, Ningbo 315211, China;;3. Department of Physics, Dalian Maritime University, Dalian 116026, China
This work has been supported by the National Natural Science Foundation of China (Nos.51472125 and 51272109), and the K. C. Wong Magna
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