Man-man Tian
College of Physics and Electronic Information, Anhui Normal University, Wuhu, 241000, ChinaJia-jia Mi
College of Physics and Electronic Information, Anhui Normal University, Wuhu, 241000, ChinaJian-ping Shi
College of Physics and Electronic Information, Anhui Normal University, Wuhu, 241000, ChinaNan-nan Wei
College of Physics and Electronic Information, Anhui Normal University, Wuhu, 241000, ChinaLing-li Zhan
College of Physics and Electronic Information, Anhui Normal University, Wuhu, 241000, ChinaWan-xia Huang
College of Physics and Electronic Information, Anhui Normal University, Wuhu, 241000, ChinaZe-wen Zuo
College of Physics and Electronic Information, Anhui Normal University, Wuhu, 241000, ChinaChang-tao Wang
State Key Laboratory of Optical Technologies for Microfabrication, Institute of Optics and Electronics, Chinese Academy of Sciences, Chengdu, 610209, ChinaXian-gang Luo
State Key Laboratory of Optical Technologies for Microfabrication, Institute of Optics and Electronics, Chinese Academy of Sciences, Chengdu, 610209, Chinathe Open Fund of State Key Laboratory of Optical Technologies for Microfabrication,Institute of Optics and Electronics,Chinese Academy of Sciences(No.KFS-02)
Man-man Tian, Jia-jia Mi, Jian-ping Shi, Nan-nan Wei, Ling-li Zhan, Wan-xia Huang, Ze-wen Zuo, Chang-tao Wang, Xian-gang Luo.248 nm imaging photolithography assisted by surface plasmon polariton interference[J]. Optoelectronics Letters,2014,10(1):24-26
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