Jia-wei Zhang
Tianjin Key Laboratory of Film Electronic and Communication Devices, School of Electronics Information Engineering, Tianjin University of Technology, Tianjin, 300384, ChinaYu-ming Xue
Tianjin Key Laboratory of Film Electronic and Communication Devices, School of Electronics Information Engineering, Tianjin University of Technology, Tianjin, 300384, ChinaWei Li
National Key Laboratory of Power Sources, Tianjin Institute of Power Sources, Tianjin, 300381, ChinaYan-min Zhao
National Key Laboratory of Power Sources, Tianjin Institute of Power Sources, Tianjin, 300381, ChinaZai-xiang Qiao
National Key Laboratory of Power Sources, Tianjin Institute of Power Sources, Tianjin, 300381, ChinaThis work has been supported by the National High Technology Research and Development Program of China (No.2012AA050701).
Jia-wei Zhang, Yu-ming Xue, Wei Li, Yan-min Zhao, Zai-xiang Qiao. Morphology of CIGS thin films deposited by single-stage process and three-stage process at low temperature[J]. Optoelectronics Letters,2013,9(6):449-453
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