Design and fabrication of a novel high damage threshold HfO2/TiO2/SiO2 multilayer laser mirror
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Abstract:
This paper describes a new method to design a laser mirror with high reflectivity, wide reflection bandwidth and high laserinduced damage threshold. The mirror is constructed by three materials of HfO2/TiO2/SiO2 based on electric field and temperature field distribution characteristics of all-dielectric laser high reflector. TiO2/SiO2 stacks act as the high reflector (HR) and broaden the reflection bandwidth, while HfO2/SiO2 stacks are used for increasing the laser resistance. The HfO2/TiO2/SiO2 laser mirror with 34 layers is fabricated by a novel remote plasma sputtering deposition. The damage threshold of zero damage probability for the new mirror is up to 39.6 J/cm2 (1064 nm, 12 ns). The possible laser damage mechanism of the mirror is discussed.
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This work has been supported by the National Natural Science Foundation of China (No.50802080) and the Natural Science Foundation of Fujian Province of China (No.2010J01349).
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