Threshold control in VCSELs by proton implanted depth
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O572.3

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    Abstract:

    The proton implantation is one of key procedures to confine the current diffusion in vertical cavity surface emitting lasers(VCSELs),in which the proton implanted depth and profile are main parameters.Threshold characteristics of VCSELs with various proton implanted depths are studied after optical,electrical and thermal fields have been simulated self-consistently in three dimensions.It is found that for VCSELs with confinement radius of 2 mm,increasing proton implanted depth can reduce the inj...

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ZHAO Hong-dong, SUN Mei, Wang Wei, Ma Lian-xi, LIU Hui-li, LI Wen-chao, LIU Qi. Threshold control in VCSELs by proton implanted depth[J]. Optoelectronics Letters,2011,7(4):263-265

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