650 nm GalnP/AlGaInP laser diodes with low threshold and compressively strained MQW active layer
DOI:
Author:
Affiliation:

Clc Number:

TN248.4

Fund Project:

  • Article
  • |
  • Figures
  • |
  • Metrics
  • |
  • Reference
  • |
  • Related
  • |
  • Cited by
  • |
  • Materials
  • |
  • Comments
    Abstract:

    650 nm AIGalnP/GalnP laser diodes with compressively strained MQW active layer have been successfully fabricated by means of single epitaxy growth. The threshold current is 6.4 mA,at 40 mA CW operation, the fundamental transverse-mode still remains, and the output power and the slope efficiency can reach 34 mW and 1.1 mW/mA respectively. The dead output power in CW operation can reach 66 mW at a saturation current of 88 mA. During 200 h burn in test,the laser diodes show good stabilization with a degradation of less than 8 %.

    Reference
    Related
    Cited by
Get Citation

Xia Wei, Li Shu-qiang, Wang Ling, Ma De-ying, Zhang Xin, Wang Fu-xun, Ji Gang, Liu Ding-wen, Ren Zhong-xiang, Xu Xian-gang, Mei Liang-mo.650 nm GalnP/AlGaInP laser diodes with low threshold and compressively strained MQW active layer[J]. Optoelectronics Letters,2006,2(4):263-265

Copy
Share
Article Metrics
  • Abstract:
  • PDF:
  • HTML:
  • Cited by:
History
  • Received:December 12,2005
  • Revised:
  • Adopted:
  • Online:
  • Published: